Electrical and Computer Engineering Dept
University of California, San Diego
San Diego, CA 92093-0407

Phone: (858) 822-5003
Fax: (858) 534-7029
Email: chpark@vlsicad.ucsd.edu
Office: 3819 APM, UCSD

Areas of Interest

VLSI-CAD: physical design automation, Optical Proximity Correction, Phase Shift Mask, Design for Manufacturing.

Biographical Sketch

Chul Hong Park received his M.S. & B.S. in Mathematics from Kyung Hee university, Seoul, Korea. He worked CAE team, Semicondutor R&D Center, Samsung Electronics. He joined the Electrical and Computer Egineering Department at UCSD in Fall 2003.

Research

Chul-Hong's current research interests focused on issues of the design for manufacturing induced by mask, photo, etch process. He also studys algorithms in the field of VLSI CAD under Andrew B. Kahng, with whom he research the various problems in VLSI CAD.

Selected Publications

• P. Gupta, A. B. Kahng and C.-H. Park, "Detailed Placement for Improved Depth of Focus and CD Control", Proc. Asia and South Pacific Design Automation Conf., Jan. 2005, pp. 343-348.
• P. Gupta, A. B. Kahng and C.-H. Park, "Manufacturing-aware Design Methodology for Assist Feature Correctness", Proc. SPIE Conf. on Design and Process Integration for Microelectronic Manufacturing.
• P. Gupta, A. B. Kahng, C.-H. Park, K. Samadi and X. Xu, "Wafer Topography-Aware Optical Proximity Correction", to appear in IEEE Transactions on Computer-Aided Design.
• A. B. Kahng, C.-H. Park, P. Sharma and Q. Wang, "Lens Aberration-Aware Timing-Driven Placement", Proc. Design Automation and Testing in Europe, March 2006, pp. 890-895.

Industry Connections and Links

• KLA-Tencor
  • On-line Lithography Glossary, written by Chris Mack
  • PROLITH technical papers document over two decades of leading-edge research and development in lithography process optimization.
  • PROLITH Lithography Optimization tool
  • ProBEAM E-Beam Lithography Optimization tool
  • ProDATA Advanced CD Analysis